finfet metal gate
由WTu著作·2022—Themetalgate(MG)heightcomposedofcomplicatedworkfunctionmetal(WFM)filmsiscrucialtothedeviceandyieldperformanceattheFinFETTechnology.,由RMLuna-Sánchez著作·2006·被引用1次—TheTiN-gateCMOSFinFETtechnologiesforhigh-performanceconnected-d...
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AnNworkfunctionmetalforagatestackofafieldeffecttransistor(FinFET)andmethodofformingthesameareprovided.AnembodimentFinFETincludesa ...
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